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Advanced Lithography for Integrated Systems Lab. (ALIS)

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Increase of light extraction from GaN based light emitting diodes incorporating patterned structure by colloidal lithography
  • AuthorTae Sun Kim, Sang-Mook Kim, Yun Hee Jang, and Gun Young Jung
  • Year2007
  • SourceAppl. Phy. Lett., 91, 171114 (2007)

Hardened nano-imprinting stamp
  • Year2006

Formation on a self-assembled monolayer by vapor phase deposition to act as the release layer on the mold fornano-imprint lithography
  • Year2006

Apparatus for imprinting lithography and fabrication thereof
  • Year2006

Increasing adhesion in an imprinting procedure
  • Year2006

Circuit fabrication at 17 nm half-pitch by nanoimprint lithography
  • AuthorG. Y Jung, W. Wu, Z. Yu, S.Y. Wang, Z. Li, R.S. Williams, E. Johnston-Halperin, J.E. Green, B.A. Sheriff, A. Boukai, Y. Bunimovich and J.R. Heath
  • Year2006
  • SourceNano Letters, 6, 351 (2006)

Electroless deposition of Au nanocrystals on Si(111) surfaces as catalysts for epitaxial growth of Si nanowires
  • AuthorA.A. Yasseri, S. Sharma, G.Y. Jung and T.I. Ted
  • Year2006
  • SourceElectrochem. Solid St. Lett., 9, C185 (2006)

Fabrication of 30nm pitch imprint moulds by frequency doubling for nanowire arrays
  • AuthorZ. Yu, W. Wu, G.Y. Jung, D.L. Olynick, J. Straznicky, X. Li, Z. Li, W.M. Tong, J.A. Liddle, S.Y. Wang and R.S. Williams
  • Year2006
  • SourceNanotechnology, 17, 4956 (2006)

Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch
  • AuthorH. Ge, W. Wu, Z. Li, G.Y. Jung, D. Olynick, C. Yuan, S.Y. Wang
  • Year2005
  • SourceR. Stanley Williams, Nano Letters, 5, 179 (2005)

Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography
  • AuthorG.Y. Jung, W. Wu, Z. Li, Y. Chen, S.Y. Wang, W.M. Tong and R.S. Williams
  • Year2005
  • SourceLangmuir, 21, 1158 (2005)
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